Enhanced Repressor Domain for TAL Effector (SID4X)
(Plasmid #43882)

• Depositing Lab: Feng Zhang
• Publication: Cong et al Nat Commun. 2012 Jul 24;3:968. doi: 10.1038/ncomms1962.

Backbone

• Vector backbone: pUC57
• Backbone manufacturer: Genscript
• Backbone size w/o insert (bp): 2710

Growth in Bacteria

• Bacterial Resistance(s): Ampicillin, 100 μg/mL
• Growth Temperature: 37°C
• Growth Strain(s): DH5alpha
• Copy number: High Copy

Gene/Insert

• Gene/Insert name: SID4X Domain
• Alt name: SID domain
• Alt name: Enhanced Repressor Domain for TAL Effector (SID4X)
• Alt name: mSin Interaction Domain
• Insert Size (bp): 432

Cloning Information

• Cloning method: Restriction Enzyme
• 5′ cloning site: NheI (not destroyed)
• 3′ cloning site: XbaI (destroyed during cloning)
• 5′ sequencing primer: pUC57 Forward (GTAAAACGACGGCCAGTG)
• 3′ sequencing primer: pUC57 Reverse (GGAAACAGCTATGACCATG)

Resource Information

• Article Citing this Plasmid:
  • 1 Reference

Terms and Licenses

• Academic/Nonprofit Terms:
  • UBMTA
• Industry Terms:
  • Not Available to Industry

Depositor Comments

This enhanced SID domain (SID4X domain) is to be used with TALE effectors to create TALE repressors, as described in Cong et al. Nature Communications. This new domain replaces the previous SID domain reported in the original article.