pCMV_NESPylRS(WT)_hU6tRNAPyl
(Plasmid
#223509)
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PurposePylRS (WT)/tRNA Pyl orthogonal pair for genetic code expansion that allows site-specific incorporation of noncanonical amino-acids into a POI using the Amber stop codon
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Depositing Lab
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Sequence Information
Ordering
Item | Catalog # | Description | Quantity | Price (USD) | |
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Plasmid | 223509 | Standard format: Plasmid sent in bacteria as agar stab | 1 | $85 |
Backbone
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Vector backbonepCMV
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Vector typeMammalian Expression
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Selectable markersHygromycin
Growth in Bacteria
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Bacterial Resistance(s)Ampicillin, 100 μg/mL
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Growth Temperature37°C
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Growth Strain(s)DH5alpha
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Copy numberHigh Copy
Gene/Insert 1
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Gene/Insert nameNES Pyrrolysyl-tRNA Synthetase
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SpeciesMethanosarcina mazei
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Insert Size (bp)1392
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Entrez GenepylS (a.k.a. MM_RS07465, MM_1445)
- Promoter CMV, SP6
Cloning Information for Gene/Insert 1
- Cloning method Restriction Enzyme
- 5′ cloning site unknown (unknown if destroyed)
- 3′ cloning site unknown (unknown if destroyed)
- 5′ sequencing primer n/a (Common Sequencing Primers)
Gene/Insert 2
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Gene/Insert nametRNA Pyl
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SpeciesMethanosarcina mazei
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Insert Size (bp)321
- Promoter U6
Cloning Information for Gene/Insert 2
- Cloning method Restriction Enzyme
- 5′ cloning site unknown (unknown if destroyed)
- 3′ cloning site unknown (unknown if destroyed)
- 5′ sequencing primer n/a (Common Sequencing Primers)
Resource Information
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Supplemental Documents
Terms and Licenses
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Academic/Nonprofit Terms
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Industry Terms
- Not Available to Industry
Trademarks:
- Zeocin® is an InvivoGen trademark.
These plasmids were created by your colleagues. Please acknowledge the Principal Investigator, cite the article in which the plasmids were described, and include Addgene in the Materials and Methods of your future publications.
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For your Materials & Methods section:
pCMV_NESPylRS(WT)_hU6tRNAPyl was a gift from Edward Lemke (Addgene plasmid # 223509 ; http://n2t.net/addgene:223509 ; RRID:Addgene_223509) -
For your References section:
Debugging Eukaryotic Genetic Code Expansion for Site-Specific Click-PAINT Super-Resolution Microscopy. Nikic I, Estrada Girona G, Kang JH, Paci G, Mikhaleva S, Koehler C, Shymanska NV, Ventura Santos C, Spitz D, Lemke EA. Angew Chem Int Ed Engl. 2016 Dec 23;55(52):16172-16176. doi: 10.1002/anie.201608284. Epub 2016 Nov 2. 10.1002/anie.201608284 PubMed 27804198